马宏平

  职称:青年副研究员

  邮箱:hpma@fudan.edu.cn




个人简介 

马宏平,博士,复旦大学青年副研究员。2011年获同济大学学士学位,2017年获同济大学博士学位。2017年至2020年在复旦大学微电子学院进行博士后研究。2020年10月入职复旦大学。研究领域为宽禁带半导体材料与器件工艺,在Nano Energy、Chemistry of Materials、ACS Applied Materials & Interfaces、Nanoscale、Journal of Materials Chemistry C、Optics Letters、Applied Physics Letters、Nanomaterials等期刊共发表30余篇论文,申请国家发明专利12项。获2019年度复旦大学优秀博士后等荣誉,现在超越照明研究所招物理、电子、材料等方向的硕士研究生。



研究方向

1. SiC衬底、外延及材料表征
2. 功率半导体器件设计和研发
3. 功能材料制备及光电器件应用
4. 超宽禁带半导体材料、工艺及器件应用的前瞻性研究



代表性成果

科研项目

1.国家自然科学基金青年基金,25万元,主持,2019.01-2021.12

2.中国博士后科学基金第63批面上项目,5万元,主持,2018.05-2020.08

3.中国博士后科学基金第12批特别资助项目,18万元,主持,2019.05-2020.08

  

学术论文

1. Hong-Ping Ma, Jia-He Yang, Jia-Jia Tao, Kai-Ping Yuan, Pei-Hong Cheng, Wei Huang, Jia-Cheng Wang, Qixin Guo, Hong-Liang Lu, and David Wei Zhang, Low-temperature epitaxial growth of high-quality GaON films on ZnO nanowires for superior photoelectrochemical water splitting, Nano Energy, 66, 104089, 2019IF=16.602

2. Hong-Ping Ma, Xiao-Xi Li, Jia-He Yang, Peihong Cheng, Wei Huang, Jingtao Zhu, Tien-Chien Jen, Qixin Guo, Hong-Liang Lu, and David Wei Zhang, Composition and Properties Control Growth of High-Quality GaOxNy Film by One-Step Plasma-Enhanced Atomic Layer Deposition, Chemistry of Materials, 31(18), 7405-7416, 2019IF=9.567

3. Hong-Ping Ma, Jia-He Yang, Jian-Guo Yang, Li-Yuan Zhu, Wei Huang, Guang-Jie Yuan, Ji-Jun Feng, Tienchien Jen and Hong-Liang Lu, Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice, Nanomaterials,9(1): 55, 2019IF=4.324

4. Hong-Ping Ma, Hong-Liang Lu, Tao Wang, Jian-Guo Yang, Xing Li, Jin-Xin Chen, Jia-Jia Tao, Jingtao Zhu, Qi-Xin Guo and David Wei Zhang, Precise control of the microstructural, optical, and electrical properties of ultrathin Ga2O3 film through nanomixing with few atom-thick SiO2 interlayer via plasma enhanced atomic layer deposition, Journal of Materials Chemistry C, 6, 12518-12528, 2018IF=7.059

5. Jia-Jia Tao#, Hong-Ping Ma#, Kai-Ping Yuan, Yang Gu, Jian-Wei Lian, Xiao-Xi Li, Wei Huang, Michael Nolan, Hong-Liang Lu, and David Wei Zhang, Modification of 1D TiO2 nanowires with GaON by atomic layer deposition for TiO2@GaON core–shell nanowires with enhanced photoelectrochemical performance, nanoscale, 12, 7159-7173, 2020IF=6.895

6. Hong-Ping Ma, Hong-Liang Lu, Jia-He Yang, Xiao-Xi Li, Tao Wang, Wei Huang, Guang-Jie Yuan, Fadei F. Komarov, and David Wei Zhang, Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen- Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition, Nanomaterials, 8(12): 1008, 2018IF=4.324

7. Hong-Ping Ma, Xinbin Cheng, Jinlong Zhang, Hongfei Jiao, Bin Ma, Yongjian Tang, Zhouling Wu, and Zhanshan Wang, “Effect of boundary continuity on nanosecond laser damage of nodular defects in high-reflection coatings, Optics Letters, 42(3),478-481, 2017IF=3.866

8. Hong-Ping Ma, Xinbin Cheng, Jinlong Zhang, Bin Ma, Hongfei Jiao, Zhanshan Wang, Tongbao Li, Jin Yu, Zhijun Kang, and Yongjian Tang, Electric-field intensity enhancement of a series of artificial nodules in a broadband high-reflection coating, Optical Engineering, 56(1), 011027-011027, 2017

9. Hong-Ping Ma, Xinbin Cheng, Jinlong Zhang, Zhanshan Wang, and Yongjian Tang, Damage growth characteristics of artificial nodules prepared by different processes , Infrared and Laser Engineering, 46(5), 190-195, 2017

10. Tao Wang, Hong-Ping Ma, Jian-Guo Yang, Jingtao Zhu, Shi-Jin Ding, Hong-Liang Lu*, and David Wei Zhang, Investigation of the Optical and Electrical Properties of ZnO/Cu/ZnO Multilayers Grown by Atomic Layer Deposition, Journal of Alloys and Compounds,744, 381-385, 2018

11. Jin-Xin Cheng, Xiao-Xi Li, Hong-Ping Ma, Wei Huang, Zhi-Gang Ji, Chang-Tai Xia, Hong-Liang Lu*, and David Wei Zhang*, Investigation of the Mechanism for Ohmic Contact Formation in Ti/Al/Ni/Au Contacts to beta-Ga2O3 Nanobelt Field-Effect Transistors , ACS Applied Materials & Interfaces,11, 32127-32134,2019

12. Xing Li, Hong-Liang Lu*, Hong-Ping Ma, Jian-Guo Yang, Jin-Xin Cheng, Wei Huang, Qi-Xin Guo, Ji-Jun Feng and David Wei Zhang, Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition, Current Applied Physics,19(2), 72-81, 2019

13. Jin-Xin Cheng, Jia-Jia Tao, Hong-Ping Ma, Hao Zhang, Ji-Jun Feng, Chang-Tai Xia, Hong-Liang Lu*, and David Wei Zhang, Band alignment of AlN/β-Ga2O3 heterojunction interface measured by x-ray photoelectron spectroscopy , Applied Physics Letters,112(26), 261602-261208, 2018

14. Jia-Jia Tao, Hong-Liang Lu*, Yang Gu, Hong-Ping Ma, Xing Li, Jin-Xin Cheng, Wen-Jun Liu, Hao Zhang, and Ji-Jun Feng, Investigation of growth characteristics, compositions, and properties of atomic layer deposited amorphous Zn-doped Ga2O3 films, Applied Surface Science,476, 733-740, 2019

15. Li-Yuan Zhu, Kai-Ping Yuan, Jian-Guo Yang, Hong-Ping Ma, Tao Wang, Xin-Ming Ji, Ji-Jun Feng, Devi, Anjana, and Hong-Liang Lu*, Fabrication of heterostructured p-CuO/n-SnO2 core-shell nanowires for enhanced sensitive and selective formaldehyde detection, Sensors and Actuators B-Chemical,290, 233-241, 2019